Extreme ultraviolet lithography (EUVL) Equipment Market by Lightsource 2021 | IndustryARC
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Extreme ultraviolet lithography (EUVL) Equipment Market
Extreme ultraviolet lithography (EUVL) Equipment Market Analysis: By Light Source (Laser pulsed Sn plasma, ArF excimer lasers, Relativistic Vacuum tube free-electron lasers and Synchrotron radiation); By Tools and By end-user - With Forecast (2016-2021).
Report Code : ESR 0217
Published On: 05 February, 2016   Updated On: 05 February, 2016

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With the growth of the electronic device industry there has been an increasing demand for more efficient and cost effective production of electronic components to meet the rising demand. The demand for electronics comes from a number of applications which ranges from communication to consumer electronic devices to even sensor devices increases. In this respect, the demand for lithography systems increased considerably. Further to this there has been a trend in miniaturization of devices which would as a result require smaller electronic components. With miniaturization, the need for effective and specific lithography techniques has increased. In order to address this growing demand, extreme ultraviolet lithography systems have been developed.

Extreme Ultraviolet Lithography (EUVL) is a next generation lithography technology used in the manufacture of integrated circuits. The primary manufacturer of EUVL is ASML. The company believes there will be a surge in the number of projects in the 5 nm node region which will need a much higher numerical aperture than what is currently present in the market. Further to this, there will also be multiple patterning required which will be addressed by EUVL.

In terms of geographic contribution, the APAC region accounted for the highest share of EUVL systems and will continue to be the dominant market till well beyond the forecast period. Almost all of the semiconductor foundries and IDMs are located in the region and as such, lithography manufacturers and customers are present in this region. 

The market is dominated by a few key vendors who account for more than 60 percent of the market, with the remaining being occupied by much smaller players. The market conditions in terms of the level of investment required for lithography systems and technical expertise in the field ensure that the barrier for entry for new players is high. As such, only the current vendors will be able to survive and expand in the market with very less chance for a new vendor to enter.

Extreme ultraviolet lithography (EUVL) Equipment Market

The Extreme ultraviolet lithography (EUVL) Equipment market can be segmented on the basis of light source as:
  • Laser pulsed Sn plasma
  • ArF excimer lasers
  • Relativistic Vacuum tube free-electron lasers 
  • Synchrotron radiation 
In terms of tools, the Extreme ultraviolet lithography (EUVL) Equipment market has been segmented across the following:
  • Vacuum tube
  • mirrors
  • multilayer object
By end-user, the market has been segmented into following:
  • Foundry
  • Memory
  • IDM 
  • Others
The market has been segmented based on the following geographies:
  • North America
  • South America
  • APAC
  • Europe
  • Middle East 
  • Africa
Following are just a few of the companies that are operating in the Extreme ultraviolet lithography (EUVL) Equipment market:
  • ASML
  • Nikon
  • Canon
  • Vistec Semiconductor Systems
  • NuFlare Technology Inc. 
  • SUSS Microtec AG
1. Extreme ultraviolet lithography (EUVL) Equipment– Market Overview
2. Executive Summary 
3. Extreme ultraviolet lithography (EUVL) Equipment– Market Landscape 
   3.1. Market Share Analysis
   3.2. Comparative Analysis
      3.2.1. Product Benchmarking
      3.2.2. End User Profiling
      3.2.3. Top 5 Financials Analysis
4. Extreme ultraviolet lithography (EUVL) Equipment– Market Forces
   4.1. Market Drivers 
   4.2. Market Constraints
   4.3. Market Challenges
   4.4. Attractiveness of the Extreme ultraviolet lithography (EUVL) Equipment Market 
      4.4.1. Power of Suppliers
      4.4.2. Power of Customers 
      4.4.3. Threat of New Entrants 
      4.4.4. Threat of Substitution
      4.4.5. Degree of Competition
5. Extreme ultraviolet lithography (EUVL) Equipment Market – Strategic Analysis
   5.1. Value Chain Analysis
   5.2. Pricing Analysis 
   5.3. Opportunities Analysis
   5.4. Product/Market Life Cycle Analysis
   5.5. Suppliers and Distributors
6. Extreme ultraviolet lithography (EUVL) Equipment Market– By Light Source
   6.1. Laser pulsed Sn plasma
   6.2. ArF excimer lasers
   6.3. Relativistic Vacuum tube free-electron lasers
   6.4. Synchrotron radiation 
7. Extreme ultraviolet lithography (EUVL) Equipment Market – By Tools
   7.1. Vacuum tube
   7.2. Mirrors
   7.3. Multilayer object
8. Extreme ultraviolet lithography (EUVL) Equipment Market – By End-user
   8.1. Foundry
   8.2. Memory
   8.3. IDM
   8.4. Others
9. Extreme ultraviolet lithography (EUVL) Equipment Market– By Geography
   9.1. Introduction
   9.2. Global Study
   9.3. Americas
      9.3.1. North America 
      9.3.2. Brazil
      9.3.3. Argentina
      9.3.4. Others 
   9.4. Europe
      9.4.1. U.K.
      9.4.2. France
      9.4.3. Germany
      9.4.4. Others
   9.5. APAC
      9.5.1. China
      9.5.2. Japan
      9.5.3. India
      9.5.4. Others
   9.6. ROW
10. Extreme ultraviolet lithography (EUVL) Equipment Market Entropy
   10.1. New Product Launches
   10.2. M&As, Collaborations, JVs and Partnerships
11. Company Profiles 
   11.1. Canon
   11.2. Nikon
   11.3. ASML
   11.4. NuFlare Technology
   11.5. SUSS Microtec AG
   11.6. Ultratech Inc.
   11.7. Vistec Semiconductor Systems
   11.8. Others
*More than 40 Companies are profiled in this Research Report, Complete List available on Request*
"*Financials would be provided on a best efforts basis for private companies"
12. Appendix
   12.1. Abbreviations
   12.2. Sources
   12.3. Research Methodology
   12.4. Bibliography
   12.5. Compilation of Expert Insights
   12.6. Disclaimer
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